Titanium Sputtering Target

Titanium Rotating Target Tube

Titanium Rotating Target Tube
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Product Details

Purity:99.7%-99.995%

Grain size:<100um

Production process:

Ingot casting

Thermo mechanical processing, precision machining

Application:Semiconductor materials, vacuum coating, pvd, cvd

Item

purity

Density

shape

Dimension(mm)

Application

Ti target

2N8-4N

4.15

Tube,disc,plate

OD127 x ID105 x L

OD219 x ID194 x L

OD300 x ID155 x L

Other as customized


Vacuum coating, sputter coating

Zr Target

2N5-4N

6.5

Tube,disc,plate

customized


Ta target

3N5-4N

16.68

Tube,disc,plate

customized



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