Titanium tube target is one of the main performance indicators of purity by the target, because the purity of the target has a great effect on the properties of the film. So what are the main performance requirements of the titanium target? The following is the titanium tube target manufacturer to introduce you.
Purity is one of the main performance indicators of the target, because the purity of the target has a great influence on the properties of the film. However, in practical applications, the purity of the target requirements are not the same. For example, with the rapid development of the microelectronics industry, the wafer size from 6 ", 8" to 12 ", and the wiring width from 0.5um reduced to 0.25um, 0.18um or even 0.13um, 99.995% before the target purity Can meet the 0.35umIC process requirements, and the preparation of 0.18um lines on the target purity is required 99.999% or even 99.9999%
The impurities in the target solids and the oxygen and moisture in the pores are the main source of contamination for the deposited film. Different requirements of the target for different impurity requirements are also different. For example, the semiconductor industry with pure aluminum and aluminum alloy target, the alkali content and radioactive element content has special requirements.
In order to reduce the pores in the target solids and improve the performance of the sputtered film, it is generally desirable that the target has a high density. The density of the target not only affects the sputtering rate, but also affects the electrical and optical properties of the film. The higher the target density, the better the performance of the film. In addition, increasing the density and strength of the target allows the target to better withstand thermal stress during sputtering. Density is also one of the key performance indicators of the target.